System Specifications

Load-Lock chamber pumped with a CTI-8F cryogenic pump. Includes substrate pre-heat.
Process chamber pumped with a CTI-8 cryo pump
Mechanical vacuum pump for process chamber and Load-lock roughing.
Tooling: Continuous pallet loading In and Out. Up to 12” substrate.
Three “Inset” cathode assemblies.
Upgraded AE MDX10, 10kW DC Magnetron power supply switched between targets.
Etch/clean: RF etch station located in main process chamber.
Includes upgraded ENI ACG-10B RF Generator.
Control system: OEM computer control system for automatic sequencing.

MRC Model MRC 943

System is available in a fully operational and demonstrated condition at Semicore, Livermore, CA. Upgrades and modification may be quoted separately.